Experimental Ellipsometer Experiment

This ellipsometer system is designed for accurate measurement of thin film thickness and optical properties using ellipsometric analysis. The instrument provides precise angle measurement, high-resolution optical alignment, and computer-based data analysis, making it ideal for advanced optics and thin-film characterization experiments. Manufactured by Atico Export India.

Thickness Measurement Range :

• 1 nm – 300 nm

Incident Angle Range :

• 30° – 90°, Error ≤ 0.1°

Polarizer & Analyzer Intersection Angle :

• 0° – 180°

Disk Angular Scale :

• 2° per scale

Vernier Minimum Reading :

• 0.05°

Optical Center Height :

• 152 mm

Work Stage Diameter :

• Ø50 mm

Overall Dimensions :

• 730 × 230 × 290 mm

Weight :

• Approximately 20 kg

Standard Accessories :

• Ellipsometer Unit – 1
• He-Ne Laser – 1
• Photoelectric Amplifier – 1
• Photo Cell – 1
• Silica Film on Silicon Substrate – 1
• Analysis Software – 1
• Instruction Manual – 1