Measurement of Diffraction Intensity Enhanced Optics Educational Kits

The Measurement of Diffraction Intensity Enhanced Optics Educational Kits is designed for quantitative investigation of optical diffraction and interference phenomena. The system enables detailed analysis of diffraction and interference patterns produced by single slits, multiple slits, and single-wire diffraction elements. The apparatus offers multiple data acquisition options, allowing users to select the most suitable method for observation, measurement, and analysis. Depending on the selected configuration, diffraction intensity distributions can be measured manually, displayed in real time, or acquired directly on a computer for advanced processing and analysis. The inclusion of a high-resolution linear CCD detector enables simultaneous acquisition of entire diffraction patterns without mechanical scanning. This compact design improves efficiency and allows real-time visualization of diffraction intensity distributions, making the system ideal for optics laboratories and advanced physics education. Physics Lab Experiments from Atico Exports.

Diffraction Studies :

• Single-Slit Diffraction
• Single-Wire Diffraction
• Double-Slit Interference and Diffraction
• Triple-Slit Diffraction
• Quadruple-Slit Diffraction
• Five-Slit Diffraction
• Diffraction Intensity Distribution Analysis

Interference Studies :

• Double-Slit Interference
• Multi-Slit Interference
• Quantitative Fringe Analysis
• Real-Time Intensity Measurement

Option 1 – Photocell Detector System :

• Photocell Detector with Amplifier
• Manual Data Acquisition
• Includes 0.1 mm Reading Ruler
• Connected to Galvanometer

Option 2 – Linear CCD System :

• Real-Time Diffraction Pattern Display
• Connected to Oscilloscope
• Simultaneous Pattern Acquisition
• No Mechanical Scanning Required

Option 3 – CCD with Data Acquisition System :

• Includes Linear CCD System
• USB Data Acquisition Interface
• Computer-Based Measurement and Analysis
• Dedicated Software for Diffraction Studies

Optical Rail Length :

• 1.0 m

Semiconductor Laser :

• 3.0 mW @ 650 nm

Single Slits :

• 0.07 mm
• 0.10 mm
• 0.12 mm

Single Wires :

• 0.10 mm Diameter
• 0.12 mm Diameter

Double Slit :

• Slit Width: 0.02 mm
• Center Spacing: 0.04 mm

Double Slit :

• Slit Width: 0.07 mm
• Center Spacing: 0.14 mm

Double Slit :

• Slit Width: 0.07 mm
• Center Spacing: 0.21 mm

Double Slit :

• Slit Width: 0.07 mm
• Center Spacing: 0.28 mm

Triple Slit :

• Slit Width: 0.02 mm
• Center Spacing: 0.04 mm

Quadruple Slit :

• Slit Width: 0.02 mm
• Center Spacing: 0.04 mm

Five-Slit :

• Slit Width: 0.02 mm
• Center Spacing: 0.04 mm

Photocell Detector (Option 1) :

• Includes Amplifier and 0.1 mm Reading Ruler

Linear CCD (Option 2) :

• 2700 Pixels

CCD Pixel Size :

• 11 × 11 μm

CCD Spectral Range :

• 0.3–0.9 μm

CCD Connectivity :

• Synchronization and Signal Ports

CCD + DAQ System (Option 3) :

• USB Interface with Data Acquisition Software

• Quantitative Diffraction Measurements
• Real-Time Pattern Acquisition
• High-Resolution CCD Detection
• Compact Experimental Configuration
• Reduced Need for Mechanical Scanning
• Suitable for Advanced Optics and Physics Laboratories
• Stable Performance with Easy Operation
• Compact Semiconductor Laser Light Source
• Multiple Data Acquisition Methods
• Complete Experimental System
• Detailed Instruction Manual